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October 2020

supercritical co2 cleaning

Features of CO2 cleaning systems

supercritical co2 dry cleaning The supercritical CO2 cleaning systems mainly uses the principle of supercritical CO2 extraction to realize the cleaning of semiconductor silicon wafers. The semiconductor silicon wafers are placed in a supercritical CO2 fluid container (cleaning kettle), supercritical The CO2 fluid is used as a solvent to fully contact the semiconductor silicon wafer, and the soluble dirty substances… Read more »Features of CO2 cleaning systems