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October 2020

Supercritical CO2 fluid cleaning system feature

Supercritical fluid cleaning The supercritical fluid cleaning equipment mainly uses the principle of supercritical CO2 extraction to realize the cleaning of semiconductor silicon wafers. The semiconductor silicon wafers are placed in a supercritical CO2 fluid container (cleaning kettle), supercritical The CO2 fluid is used as… Read More »Supercritical CO2 fluid cleaning system feature