Supercritical CO2 cleaning machine
Supercritical CO2 cleaning machine is based on traditional wet cleaning technology, the cleaning liquid is replaced with liquid CO2, and then superfluid drying is performed.
Supercritical CO2 cleaning machine/system inherits the advantages of traditional wet cleaning technology, eliminates the Achilles heel of the final drying of the wet method
Application of supercritical CO2 cleaning machine
Supercritical CO2 cleaning machine/equipment can solve many problems in the cleaning process of the microelectronics industry.
For example, cleaning of high aspect ratio structures after etching and ashing, cleaning of porous low-dielectric materials after etching and ashing, drying after cleaning, cleaning of metal particles of semiconductor devices, etc.
Supercritical CO2 fluid characteristics
The viscosity is extremely small, which is equivalent to the viscosity of gas, with good transferability and fast moving ability;
SCF has a large diffusive power, which is more than 100 times the liquid diffusive power;
Surface tension is very small, and it can enter the slits and micro grooves for cleaning;
Supercritical CO2 fluid has a strong ability to dissolve organic dirt and some inorganic dirt on the surface of the material.
Supercritical CO2 cleaning machine Cost and CO2 cleaning equipment price
Our supercritical CO2 cleaning machine price is lower than our peers’, and our CO2 cleaning equipment is high quality, we have our own manufacturing factory, all products are factory price, there is absolutely no middleman markup, we accept both small batch scale customer and large industrial batch scale wholesale supercritical CO2 cleaning machines and waterless CO2 cleaning systems for sale online