BIT is world leader in the designing, manufacturing and sales of supercritical CO2 fluid equipment. Find out more about our supercritical fluid system!
Extraction pressure: 35MPa-105MPa;
Extraction capacity: 200mL-9000L;
Laboratory scale CO2 extractor 200mL-1000mL, Pilot and production scale CO2 extraction equipment 20L-180L, Industrial scale CO2 extraction system 200L-9000L.
Supercritical fluid fractionation column with corresponding capacity can be customized.
Supercritical water reaction equipment What is supercritical water reaction equipment Supercritical water reaction equipment/Supercritical water oxidation reactor decomposes the organic matter contained in the wastewater into simple non-toxic small molecular compounds, such as water and CO2. The use of inconel625 material solves the problems of inorganic deposits and engineering clogging. What is supercritical water oxidation Supercritical water oxidation (abbreviated as… Read More »Supercritical water reactor
Customized configuration 500ML-50L high pressure chemical reactor, optimization cost-effective supercritical CO2 fluid reactor/supercritical fluid reaction equipment.
Supercritical fluid micronization equipment/machine to prepare particles, microspheres, microcapsules, porous materials, liposomes and other nanofabrication.
supercritical CO2 drying equipment Supercritical CO2 drying equipment is an equipment that uses supercritical fluid to dry materials with the advantages of both gas and liquid properties. Working principle The object to be dried is placed in a supercritical fluid environment, the gas/liquid interface of the medium disappears, there is no liquid surface tension, the drying process is gentle, and… Read More »Supercritical dryer
BIT provides a turnkey project of supercritical CO2 dyeing machine/waterless dyeing machine.Customized and safe solutions. Ask us for a quote now. Since 1989.
Supercritical CO2 cleaning (SC-CO2) is an established precision cleaning technique, liquid CO2 cleaning, then supercritical CO2 drying is performed.
supercritical co2 dry cleaning The supercritical CO2 cleaning systems mainly uses the principle of supercritical CO2 extraction to realize the cleaning of semiconductor silicon wafers. The semiconductor silicon wafers are placed in a supercritical CO2 fluid container (cleaning kettle), supercritical The CO2 fluid is used as a solvent to fully contact the semiconductor silicon wafer, and the soluble dirty substances… Read More »Features of CO2 cleaning systems
