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Supercritical CO2 cleaning machine

Supercritical CO2 Fluid cleaning integrated circuit board

SCF cleaning integrated circuit board process parametersLaboratory equipment:L-05 Cleaning pressure: <10 MPaSeparation pressure: 6 MPaCleaning time: <90 min This is an experiment, on July 1, 2020. At the request of Taiwan Songhao Electromechanical Company, we carried out the IC board cleaning test. The samples are… Read More »Supercritical CO2 Fluid cleaning integrated circuit board

Supercritical CO2 non-destructive cleaning machine

Description With the continuous reduction of the semiconductor line width, the traditional wet cleaning technology has been unable to meet the current semiconductor development requirements for cleaning technology and equipment in many aspects. Ordinary solvents such as water cannot penetrate into small and deep structures… Read More »Supercritical CO2 non-destructive cleaning machine